The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2021
Filed:
Dec. 06, 2018
Global Frontier Center for Multiscale Energy Systems, Seoul, KR;
Korea Institute of Science and Technology, Seoul, KR;
Seoul National University R&db Foundation, Seoul, KR;
Man Soo Choi, Seoul, KR;
Jeong Hun Kim, Seoul, KR;
Hyoungchul Kim, Seoul, KR;
Ji-Won Son, Seoul, KR;
Sung Soo Shin, Seoul, KR;
Seung Yong Lee, Seoul, KR;
GlobalFrontier Center ForMultiscale Energy Systems, Seoul, KR;
Korea Institute Of Science And Technology, Seoul, KR;
Seoul National University R&DB Foundation, Seoul, KR;
Abstract
Disclosed is a method for infiltrating a porous structure with a precursor solution by means of humidification. The infiltration method with a precursor solution using moisture control comprises the steps of: (S1) providing a substrate having porous structures deposited thereon; (S2) depositing, by electrospraying, a precursor solution on the substrate having porous structures deposited thereon; (S3) humidifying the porous structures having the precursor solution deposited thereon; and (S4) sintering the humidified porous structures.