The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2021

Filed:

Jun. 21, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Scott D. Helt, Rochester, MN (US);

Kiswanto Thayib, Rochester, MN (US);

Kristopher C. Whitney, Rochester, MN (US);

Robert Miller, Rochester, MN (US);

Jennifer A. Dervin, Rochester, MN (US);

David Jones, Rochester, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/27 (2019.01); G06F 11/14 (2006.01);
U.S. Cl.
CPC ...
G06F 16/27 (2019.01); G06F 11/1464 (2013.01); G06F 2201/84 (2013.01);
Abstract

In embodiments, the ability to have two separate Db2 Mirror pair environments, each providing HA, which have the capability to switch application spaces between the Db2 Mirror pairs, is presented. At least one IASP is registered to a first node of a first pair of nodes at a first HA mirroring environment at a first location. The at least one IASP is replicated to a second HA mirroring environment, the second HA mirroring environment including a second pair of nodes at a second location, the second location different than the first location. The at least one IASP is registered with one node of the pair of nodes of the second mirroring environment, the at least one IASP is switched offline at the first pair of nodes of the first mirroring environment, and subsequently switched online at the second pair of nodes of the second mirroring environment.


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