The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2021

Filed:

Nov. 26, 2019
Applicant:

Optum Technology, Inc., Eden Prairie, MN (US);

Inventors:

Sruti Rallapalli, Hyderabad, IN;

Swapna Sourav Rout, Bangalore, IN;

Assignee:

Optum Technology, Inc., Eden Prairie, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 11/30 (2006.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06F 11/3072 (2013.01); G06F 11/3068 (2013.01); G06N 20/00 (2019.01);
Abstract

In general, embodiments of the present invention provide methods, apparatus, systems, computing devices, computing entities, and/or the like for software process failure prevention are provided herein. Such embodiments may include steps of: generating error logs at one or more phases of a software process lifecycle; preprocessing each error log to standardize error log data; grouping the preprocessed error logs based on similar characteristics of the preprocessed error logs; associating each group of preprocessed error logs with one or more discrete events of the software process lifecycle; converting each preprocessed error log into a sequence of associated discrete events of the software process lifecycle; merging redundant sequences of associated discrete events of the software process lifecycle; and identifying one or more error causing patterns for software process failure prediction from the sequences of associated discrete events of the software process lifecycle.


Find Patent Forward Citations

Rallapalli, Sruti. (2021). Log message analysis and machine-learning based systems and methods for predicting computer software process failures (U.S. Patent No. 11176015). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11176015

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