The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2021

Filed:

Sep. 12, 2019
Applicant:

Asm Nexx, Inc., Billerica, MA (US);

Inventors:

Arthur Keigler, Billerica, MA (US);

Kevin Barbera, Billerica, MA (US);

Daniel L. Goodman, Billerica, MA (US);

Assignee:

ASM NEXX, INC., Billerica, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/02 (2006.01); H01L 21/677 (2006.01); C23C 14/56 (2006.01); C23C 14/34 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 14/021 (2013.01); C23C 14/34 (2013.01); C23C 14/568 (2013.01); H01L 21/67207 (2013.01); H01L 21/67739 (2013.01);
Abstract

A vapor deposition system comprises a vacuum chamber and two or more process modules each configured for processing a semiconductor substrate. Each process module is removably connected to a respective port of the vacuum chamber such that each process module is in vacuum communication with the vacuum chamber when connected to the respective port. A port sealing mechanism is configured to create a vacuum seal at each port such that when a first port is sealed and a first process module is disconnected from the first port, a vacuum condition is maintained within the vacuum chamber while the first process module is open to atmospheric pressure.


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