The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2021
Filed:
Aug. 14, 2017
Hitachi Metals, Ltd., Tokyo, JP;
Futoshi Kuniyoshi, Minato-ku, JP;
HITACHI METALS, LTD., Tokyo, JP;
Abstract
A sintered R-T-B based magnet includes a main phase crystal grain and a grain boundary phase, in which R: not less than 27.5 mass % and not more than 35.0 mass % (R always includes at least Nd and Pr); B: not less than 0.80 mass % and not more than 1.05 mass %; Ga: not less than 0.05 mass % and not more than 1.0 mass %; M: not more than 2 mass % (where M is at least one of Cu, Al, Nb, and Zr); and a balance T (where T is Fe, or Fe and Co) and impurities. At 300-μm depth from the magnet surface, a Pr/Nd ratio in a central portion of a main phase crystal grain is lower than 1, and a Pr/Nd ratio in an intergranular grain boundary is higher than 1. The Ga concentration gradually decreases in a portion of the magnet from the surface toward the interior.