The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2021

Filed:

Mar. 16, 2018
Applicant:

Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;

Inventors:

Kenji Shimada, Tokyo, JP;

Priangga Perdana Putra, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C09D 7/63 (2018.01); C09D 7/61 (2018.01); C09D 5/00 (2006.01); H01L 21/30 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C09D 7/63 (2018.01); C09D 5/00 (2013.01); C09D 7/61 (2018.01); H01L 21/02057 (2013.01); H01L 21/30 (2013.01);
Abstract

According to the present invention, a method for treating the surface of a semiconductor substrate can be provided, the method including bringing the semiconductor substrate into contact with a liquid composition to impart alcohol repellency to the semiconductor substrate, wherein the liquid composition is characterized by containing: 0.01 to 15% by mass of each of at least two compounds selected from surfactants respectively represented by formulae (1) to (6) and salts thereof; and water. (In formulae (1) to (6), Ris selected from the group consisting of compounds in each of which a hydrogen atom in an alkyl group having 2 to 10 carbon atoms is substituted by a fluorine atom; Ris selected from the group consisting of a covalent bond, an alkylene group having 1 to 6 carbon atoms and others; Ris selected from the group consisting of a hydroxyl group, a sulfonic acid group and a carboxyl group; R, Rand Rare independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms and others; R, Rand Rare independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms and others; Xis selected from the group consisting of a hydroxide ion and others; and a represents an integer of 3 to 20 inclusive.)


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