The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2021
Filed:
Sep. 21, 2016
Applicant:
Toray Industries, Inc., Tokyo, JP;
Inventors:
Assignee:
TORAY INDUSTRIES, INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/10 (2006.01); G03F 7/20 (2006.01); C08L 79/08 (2006.01); C08K 5/13 (2006.01); G03F 7/075 (2006.01); H01L 51/05 (2006.01);
U.S. Cl.
CPC ...
C08G 73/10 (2013.01); C08L 79/08 (2013.01); G03F 7/20 (2013.01); C08K 5/13 (2013.01); C08L 2203/16 (2013.01); C08L 2203/20 (2013.01); G03F 7/0751 (2013.01); G03F 7/2022 (2013.01); H01L 51/052 (2013.01);
Abstract
A resin and a photosensitive resin composition whereby a cured film exhibiting high extensibility, reduced stress, and high adhesion to metals can be obtained are provided. A resin (A) including a polyamide structure and at least any structure of an imide precursor structure and an imide structure, wherein at least any of the structures of the resin (A) include a diamine residue having an aliphatic group.