The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2021
Filed:
Jun. 20, 2017
Genedesign, Inc., Osaka, JP;
National Institute of Advanced Industrial Science and Technology, Tokyo, JP;
Satoshi Inoue, Osaka, JP;
Kohei Himeno, Osaka, JP;
Hirokazu Nankai, Osaka, JP;
Mutsuo Tanaka, Ibaraki, JP;
Teiichi Murakami, Ibaraki, JP;
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, Tokyo, JP;
GeneDesign, Inc., Osaka, JP;
Abstract
The present invention pertains to a method for synthesizing a ribonucleic acid H-phosphonate monomer, and a method for performing oligonucleotide synthesis in which said monomer is used. The present invention pertains to a method for manufacturing an inexpensively manufacturable H-phosphonate nucleoside derivative in which selective protection is provided to position 2' of a ribonucleoside monomer required in RNA oligonucleotide synthesis. The present invention is characterized in that: hydroxyl groups in position 2′ and position 3′, which have slightly different reactivity, are caused to react with an aromatic acyl halide at low temperature to selectively esterify position 2′; and subsequently the hydroxyl group at position 3′ in one pot is captured by a phosphityl group to prevent position 2′ and position 3′ transfer of the acyl group.