The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2021

Filed:

May. 22, 2017
Applicant:

Electrophor, Inc., Woodmere, NY (US);

Inventors:

Aleksey Leonidovich Kuzmin, Saint-Petersburg, RU;

Gleb Dmitrievich Rusinov, Saint-Petersburg, RU;

Joseph Lvovich Shmidt, Woodmere, NY (US);

Assignee:

ELECTROPHOR, INC., Woodmere, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/28 (2006.01); C02F 1/42 (2006.01); B01D 24/12 (2006.01); B01D 24/10 (2006.01); C02F 1/00 (2006.01); B01D 36/00 (2006.01);
U.S. Cl.
CPC ...
B01D 24/12 (2013.01); B01D 24/10 (2013.01); B01D 36/001 (2013.01); C02F 1/001 (2013.01); C02F 1/003 (2013.01); C02F 1/283 (2013.01); C02F 1/42 (2013.01); C02F 2201/006 (2013.01); C02F 2307/04 (2013.01);
Abstract

A filtration cartridge of a liquid purification device that consists of a filtration zone () and a venting zone (), said filtration zone in turn consists of a housing () filled with a filtration material () and not less than one opening () made in the bottom () of the housing (), said venting zone consists of fixation means () and a lid (), performed so that the filtration material () has a multi-clustered interconnected structure, and the venting zone () is formed so as to retain and preserve the main structure of the filtration material () inside the housing () of the filtration cartridge, by means of the fixation means () being the first retention barrier and made as a grid, the size of mesh () of said grid does preferably not exceed the average size of the filtration material cluster, and the lid () is made as a second retention barrier and formed, with meshes () comprising net sections and a top point () of the lid () is positioned at a distance preferably not more than 1 cm above the fixation means ().


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