The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2021
Filed:
Jun. 30, 2020
Mixcomm, Inc., Chatham, NJ (US);
Harish Krishnaswamy, New York, NY (US);
Frank Lane, Easton, PA (US);
Arun Natarajan, Corvallis, OR (US);
Aristotele Hadjichristos, San Diego, CA (US);
Vikas Vinayak, Menlo Park, CA (US);
Mixcomm, Inc., Chatham, NJ (US);
Abstract
Controllable radio frequency power amplifiers (RFPAs), e.g., in a Hybrid-MIMO array, which are being driven at lower power levels, are operated at conditions such that their inherent EVM and ACLR are intentionally further increased. This increase of inherent EVM and ACLR is done in a precise manner, and the increased inherent EVM and ACLR are cancelled or reduced by the EVM and ACLR of the input Array DPD signal. The net result is improved EVM and ACLR performance over a broader range of angles. Exemplary methods and apparatus for increasing distortion include individual or combinations of: i) changing the DC bias a RFPA based on average operating power level; ii) changing supply voltage, e.g. Vcc, of a RFPA based on average operating power level, iii) adding a controllable non-linear element, such as a diode or varactor, at the input of the RFPA, based on the average operating power.