The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2021

Filed:

Jan. 15, 2021
Applicant:

Trumpf Laser Gmbh, Schramberg, DE;

Inventors:

Christoph Tillkorn, Villingendorf, DE;

Daniel Flamm, Kornwestheim, DE;

Julian Hellstern, Rottweil, DE;

Andreas Heimes, Renningen, DE;

Li-Wen Chang, Stuttgart, DE;

Maike Prossotowicz, Aichhalden, DE;

Assignee:

TRUMPF LASER GMBH, Schramberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/09 (2006.01); G02B 3/00 (2006.01); G02B 27/28 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0933 (2013.01); G02B 3/0006 (2013.01); G02B 27/285 (2013.01);
Abstract

An optical assembly includes a beam path, passing, in succession, through multiple microlens arrays and a Fourier lens assembly. The microlens arrays have a uniform aperture of their microlenses, and the entirety of the microlens arrays has an effective focal length. The optical assembly further includes an adjustment mechanism, configured to adjust a mutual optical distance of at least some of the microlens arrays in the beam path, thereby setting the effective focal length of the entirety of the microlens arrays. The adjustment mechanism has multiple adjustment positions i=1, . . . , M wherein M is a natural number ≥2, i is an adjustment position index, at which the term in each case essentially smoothly results in a natural number Ni. λ is a center wavelength, fML,i is an effective focal length fML of the entirety of the microlens arrays set by the adjustment position i.


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