The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2021
Filed:
Oct. 23, 2018
University of Rochester, Rochester, NY (US);
Romita Chaudhuri, Rochester, NY (US);
Jannick Rolland-Thompson, Seneca Falls, NY (US);
University of Rochester, Rochester, NY (US);
Abstract
Single-shot, adaptive metrology of rotationally variant optical surfaces, such as toroids, off-axis conies and freeform surfaces. An adaptive interferometric null test uses a high definition liquid crystal phase-only spatial light modulator (SLM) as the reconfigurable null element, on which a simulated nulling phase function is encoded, based on the specifications of the surface under test to generate a null interferogram. The power component of the surface sag is nulled by system design, not the SLM, enabling the SLM to fully compensate the residual departure without the need to tilt the optic or use a custom Offner-null. By wrapping the phase function at multiples of 2*pi radian, the upper limit in sag of the optic under test is theoretically removed.