The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2021

Filed:

May. 17, 2018
Applicant:

Dexerials Corporation, Tokyo, JP;

Inventors:

Hirokazu Odagiri, Sendai, JP;

Yasuyuki Kudo, Shimotsuke, JP;

Rishabh Gupta, Shimotsuke, JP;

Keiji Honjo, Kiyose, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12M 1/00 (2006.01); C12M 1/21 (2006.01); B01F 11/00 (2006.01); B01F 15/00 (2006.01);
U.S. Cl.
CPC ...
C12M 23/14 (2013.01); B01F 11/0017 (2013.01); B01F 15/0085 (2013.01); B01F 15/00844 (2013.01); C12M 23/02 (2013.01); C12M 23/26 (2013.01); C12M 41/02 (2013.01); B01F 2215/0073 (2013.01);
Abstract

Provided is a culture bag accommodating a culture fluid, the culture bag is capable of suppressing foaming in the culture fluid when oscillating the culture fluid to perform a culture, and performing a culture with high efficiency. The culture bag includes a culture space accommodating a culture fluid, the culture space being an endless space to allow the culture fluid to circulate therein, in which the culture bag has an inner surface that comes into contact with the culture fluid to be accommodated therein, the inner surface including, at least in part thereof, a first surface formed of a fine structure and a second surface formed of a structure different from that of the first structure.


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