The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2021
Filed:
Mar. 14, 2019
Applicant:
United States of America As Represented BY the Administrator of Nasa, Washington, DC (US);
Inventors:
Kevin L. Denis, Crofton, MD (US);
Edward J. Wollack, Clarksville, MD (US);
Assignee:
United States of America as represented by the Administrator of NASA, Washington, DC (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01); C08J 5/18 (2006.01); C08L 45/00 (2006.01); H01L 21/683 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C08J 5/18 (2013.01); C08L 45/00 (2013.01); H01L 21/02282 (2013.01); H01L 21/02318 (2013.01); H01L 21/6836 (2013.01); C08J 2345/00 (2013.01); H01L 2221/68386 (2013.01);
Abstract
The process to fabricate a polymer film includes baking a cyclic olefin copolymer (COC) and a silicon wafer at a predefined temperature. The process also includes attaching a plastic tape frame to the silicon wafer and submerging the COC and the plastic tape frame within water allowing one or more ultra-thin sheets of COC film to be peeled off.