The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2021
Filed:
Oct. 01, 2019
Auto Ip Llc, Las Vegas, NV (US);
Paolo Tiramani, Las Vegas, NV (US);
Kyle Denman, North Las Vegas, NV (US);
Auto IP LLC, Las Vagas, NV (US);
Abstract
An impact structure for attenuating longitudinally-directed vehicle impacts, comprising first and second attenuation plates, where the plates are spaced apart from each other at a mounting region of the impact structure and fixed to each other at an impact region of the impact structure, and the impact region is longitudinally distal from the mounting region. There is an aperture pattern on each attenuation plate, wherein each aperture of the aperture pattern on each attenuation plate has an aspect ratio defined by the maximum size of the aperture in the longitudinal direction divided by the maximum size of the aperture in the direction perpendicular to the longitudinal direction; and the aspect ratio of the apertures of the aperture pattern on each attenuation plate generally increases or decreases in the longitudinal direction between the mounting region and the impact region.