The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2021

Filed:

May. 10, 2019
Applicant:

Trumpf Laser- Und Systemtechnik Gmbh, Ditzingen, DE;

Inventors:

Björn Ullmann, Ludwigsburn, DE;

Jörg Zaiss, Eberdingen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/153 (2017.01); B22F 12/00 (2021.01); B29C 64/35 (2017.01); B29C 64/268 (2017.01); B29C 64/371 (2017.01); B28B 1/00 (2006.01); C04B 35/64 (2006.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 40/00 (2020.01); B22F 10/10 (2021.01);
U.S. Cl.
CPC ...
B22F 12/00 (2021.01); B28B 1/001 (2013.01); B29C 64/153 (2017.08); B29C 64/268 (2017.08); B29C 64/35 (2017.08); B29C 64/371 (2017.08); C04B 35/64 (2013.01); B22F 10/10 (2021.01); B22F 2201/11 (2013.01); B22F 2999/00 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 40/00 (2014.12); Y02P 10/25 (2015.11);
Abstract

A production device comprises a main housing, an optical system that provides a beam for the irradiation of powder in a building platform area of a working surface for producing a component layer by layer, and a shielding gas system for providing a two-dimensional stream of shielding gas. The shielding gas system has at least one outlet opening structure and a suction-removal opening structure on opposite sides of the main housing, and the two-dimensional stream of shielding gas flows over the working surface between the opposite sides. The shielding gas system also has at least one secondary outlet opening for the flowing in of gas in the direction of the two-dimensional stream of shielding gas, which is designed for the forming of at least one secondary stream of shielding gas, which plays a part in determining the flow profile of the two-dimensional stream of shielding gas.


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