The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2021

Filed:

May. 25, 2018
Applicant:

Topcon Corporation, Tokyo, JP;

Inventors:

Yasufumi Fukuma, Tokyo, JP;

Kazuhiro Oomori, Tokyo, JP;

Assignee:

Topcon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/135 (2006.01); A61B 3/10 (2006.01);
U.S. Cl.
CPC ...
A61B 3/135 (2013.01); A61B 3/102 (2013.01);
Abstract

The object of the present invention is to develop an ophthalmologic microscope of a new method that increases the degree of freedom in the optical design in the Galilean ophthalmologic microscope provided with an OCT optical system. The present invention provides an ophthalmologic microscope, wherein an observation optical system, an objective lens, and an OCT optical system are placed in such a way that the optical axis of the OCT optical system does not penetrate through objective lens, and the optical axis of the observation optical system and the optical axis of the OCT optical system are non-coaxial, and wherein the ophthalmologic microscope further comprises a SLO optical system that scans a light ray which is a visible ray, a near infrared ray, or an infrared ray and guides the light to the subject's eye so as to become substantially coaxial with the optical axis of the OCT optical system.


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