The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2021

Filed:

Feb. 19, 2020
Applicant:

Toyoda Gosei Co., Ltd., Kiyosu, JP;

Inventor:

Junya Nishii, Kiyosu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/808 (2006.01); H01L 29/20 (2006.01); H01L 29/78 (2006.01); H01L 27/105 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4236 (2013.01); H01L 27/105 (2013.01); H01L 29/2003 (2013.01); H01L 29/66666 (2013.01); H01L 29/7827 (2013.01); H01L 29/8083 (2013.01);
Abstract

The present invention provides a Group III nitride semiconductor device in which current concentration at the corners of the trench is suppressed. The semiconductor device has a pattern in which regular hexagonal unit cells are arranged in a honeycomb pattern. The semiconductor layer is sectionalized into regular hexagonal patterns by the trench. The recess has a small regular hexagonal pattern contained in the regular hexagonal pattern of the semiconductor layer sectionalized by the trench, which is obtained by reducing the regular hexagon of the semiconductor layer with the same center. Moreover, the regular hexagonal pattern of the recess is rotated by 30° with respect to the regular hexagon of the semiconductor layer. The Mg activation ratio is lower in the vicinity of corners of the trench than that in other regions in the vicinity of side walls of the trench of the p-type layer.


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