The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2021

Filed:

Jan. 16, 2019
Applicant:

Omron Corporation, Kyoto, JP;

Inventors:

Shinsuke Kawanoue, Kyoto, JP;

Kota Miyamoto, Kyoto, JP;

Reiko Hattori, Kyoto, JP;

Yuki Hirohashi, Kyoto, JP;

Assignee:

OMRON Corporation, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05B 17/02 (2006.01); G06N 20/00 (2019.01); G05B 23/02 (2006.01); G06F 11/07 (2006.01); G06N 7/00 (2006.01);
U.S. Cl.
CPC ...
G05B 17/02 (2013.01); G05B 23/0254 (2013.01); G06F 11/0751 (2013.01); G06N 7/005 (2013.01); G06N 20/00 (2019.01);
Abstract

An abnormality detection system, support device, and model generation method are provided for generating a more highly accurate abnormality detection model before an actual operation. A model generation part of an abnormality detection system includes a section for generating plural feature values from state values provided from a state value storage part, a section for selecting a combination of one or plural feature values among the plural generated feature values, a section for generating an extra learning data set having at least part of a data series of the feature values of the selected combination and a data series of statistically generated virtual feature values, and a section for evaluating a detection accuracy of a model corresponding to the feature values of the selected combination using the extra learning data set.


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