The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Apr. 06, 2017
Applicant:
Koninklijke Philips N.v., Eindhoven, NL;
Inventor:
Marcus Antonius Verschuuren, Eindhoven, NL;
Assignee:
Koninklijke Philips N.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 33/38 (2006.01); C08G 77/06 (2006.01); B29C 33/42 (2006.01); B81C 1/00 (2006.01); B29K 83/00 (2006.01); B29L 31/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/3842 (2013.01); B29C 33/424 (2013.01); B81C 1/0046 (2013.01); C08G 77/06 (2013.01); B29C 2033/426 (2013.01); B29K 2083/00 (2013.01); B29L 2031/757 (2013.01);
Abstract
Disclosed is a stamp () for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion () and a patterned surface comprising a feature pattern () for imprinting an imprinting composition () wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.