The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Dec. 30, 2019
Industrial Technology Research Institute, Hsinchu, TW;
Ludovic Angot, Hsinchu, TW;
Yueh-Yi Lai, Hsinchu County, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
System and method for profile measurement are provided. The profile measurement system includes a light projector, an imaging device, a control system, and a processing unit. The light projector includes a light source, a mask, and an optical system. An aperture of the mask allows a portion of light to pass through and generates a pattern. The optical system includes a variable focal length lens element configured to project the pattern at different projection distances. The imaging device is configured to capture images of the pattern projected at the different projection distances. The control system is configured to control a projection distance of the light projector and a focus distance of the imaging device. The processing unit is configured to obtain in-focus pixels in the captured images, generate mask images, reconstruct a large depth of field pattern image based on the captured images and reconstruct the object profile.