The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Apr. 03, 2018
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Assignee:
Merck Patent GmbH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 183/16 (2006.01); C08K 5/16 (2006.01); C08L 83/16 (2006.01); C08J 7/048 (2020.01); B05D 3/06 (2006.01); C08G 77/62 (2006.01); C08J 5/18 (2006.01); C08K 5/01 (2006.01); C08K 5/18 (2006.01); C08K 5/34 (2006.01); C08L 83/04 (2006.01);
U.S. Cl.
CPC ...
C08L 83/16 (2013.01); B05D 3/067 (2013.01); C08G 77/62 (2013.01); C08J 5/18 (2013.01); C08J 7/048 (2020.01); C08K 5/01 (2013.01); C08K 5/18 (2013.01); C08K 5/34 (2013.01); C08L 83/04 (2013.01); C08J 2383/16 (2013.01); C08L 2201/14 (2013.01); C08L 2203/16 (2013.01); C08L 2203/20 (2013.01); C08L 2205/02 (2013.01);
Abstract
[Problem] To provide a film forming composition and a film forming method capable of forming a film excellent in gas barrier properties. [Means for Solution] A film forming composition comprising a polysilazane, an organic solvent and an additive having a specific structure, and a film forming method comprising applying the composition on a substrate and exposing the composition to light. This specific additive is represented by a specific general formula among those having a nonconjugated cyclic structure composed of atoms selected from the group consisting of carbon, nitrogen and oxygen in the structure.