The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2021

Filed:

Nov. 15, 2018
Applicant:

Saint-gobain Ceramics & Plastics, Inc., Worcester, MA (US);

Inventors:

Stephen Bottiglieri, Northbridge, MA (US);

Nabil Nahas, Mougins, FR;

Douglas E. Ward, Santa Ana, CA (US);

Chun-Lung Kuan, Anaheim, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01G 25/02 (2006.01); C09K 3/14 (2006.01); C09G 1/02 (2006.01); C01F 17/235 (2020.01);
U.S. Cl.
CPC ...
C01G 25/02 (2013.01); C01F 17/235 (2020.01); C09G 1/02 (2013.01); C09K 3/1436 (2013.01); C01P 2002/84 (2013.01); C01P 2004/51 (2013.01); C01P 2004/61 (2013.01); C01P 2004/62 (2013.01); C01P 2004/64 (2013.01); C01P 2006/12 (2013.01);
Abstract

A composition can comprise a carrier including a liquid and an abrasive particulate contained in the carrier, the abrasive particulate having, on average, at least 10 wt % cerium oxide in the abrasive particulate and a cerium 3+ ratio (Ce 3+/total cerium) of at least 0.1. In another embodiment, a slurry composition can comprise a liquid carrier comprising water, cerium oxide particles, and free silicate ions, wherein a material removal rate when polishing a silicon oxide wafer can be is increased by at least 3% in comparison to a slurry composition not including free silicate ions.


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