The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2021
Filed:
Jun. 22, 2021
Weta Digital Ltd., Wellington, NZ;
Andrea Weidlich, Montreal, CA;
Marc Droske, Wellington, NZ;
Weta Digital Ltd., Wellington, NZ;
Abstract
Presented here is a system and method to increase the speed of computation of a volumetric scattering render technique. The volumetric scattering can include path tracing which simulates interactions between a virtual ray of light and a volume. The interaction can include reflection of the virtual ray of light of a particle within the volume. The system can obtain a threshold number of interactions between a virtual ray of light and a three-dimensional object through which the virtual ray of light is traveling. As the system performs the simulation, the system can compare a number of the interactions to the threshold number. Upon determining that the number of interactions is equal to or exceeds the threshold number, the system can terminate the simulation and approximate interactions between the virtual ray of light and the volume using a second rendering technique that is computationally less expensive than simulating the interactions.