The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2021

Filed:

Dec. 18, 2020
Applicant:

Nextvpu (Shanghai) Co., Ltd., Shanghai, CN;

Inventors:

Shu Fang, Shanghai, CN;

Ji Zhou, Shanghai, CN;

Xinpeng Feng, Shanghai, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/593 (2017.01); G06K 9/62 (2006.01); G06T 3/40 (2006.01); G06K 9/46 (2006.01);
U.S. Cl.
CPC ...
G06T 7/593 (2017.01); G06K 9/46 (2013.01); G06K 9/6232 (2013.01); G06T 3/40 (2013.01);
Abstract

A disparity estimation method, an electronic device, and a computer-readable storage medium are provided. The disparity estimation method includes: performing feature extraction on each image in an image pair; and performing cascaded multi-stage disparity processing according to the extracted image features to obtain multiple disparity maps with increasing sizes. The input of a first stage disparity processing in the multi-stage disparity processing includes multiple image features each having a size corresponding to the first stage disparity processing, and the input of disparity processing of each stage other than the first stage disparity processing in the multi-stage disparity processing includes: one or more image features each having a size corresponding to disparity processing of the stage and a disparity map generated by disparity processing of an immediate previous stage.


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