The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2021
Filed:
Dec. 26, 2018
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Hitoshi Maruyama, Annaka, JP;
Kazunori Kondo, Annaka, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/30 (2006.01); C08G 77/12 (2006.01); C08G 77/20 (2006.01); H01L 21/027 (2006.01); C08L 63/00 (2006.01); C08G 59/30 (2006.01); G03F 7/038 (2006.01); G03F 7/32 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C08G 59/306 (2013.01); C08G 77/12 (2013.01); C08G 77/20 (2013.01); C08L 63/00 (2013.01); G03F 7/038 (2013.01); G03F 7/0755 (2013.01); G03F 7/30 (2013.01); H01L 21/0274 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01);
Abstract
A photosensitive resin composition comprising a dual end alicyclic epoxy-modified silicone resin having formula (A1) and a photoacid generator is provided. In formula (A1), Rto Rare a C-Cmonovalent hydrocarbon group and n is an integer of 1-600. The composition enables pattern formation using radiation of widely varying wavelength, and the patterned film has high transparency, light resistance, and heat resistance.