The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2021

Filed:

Dec. 19, 2017
Applicants:

Albert-ludwigs-universitaet Freiburg, Freiburg, DE;

Fachhochschule Vorarlberg Gmbh, Dornbirn, AT;

Inventors:

Stefan Partel, Bildstein, AT;

Stephan Kasemann, Feldkirch, AT;

Can Dincer, Freiburg, DE;

Jochen Kieninger, Freiburg, DE;

Gerald Urban, Freiburg, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/08 (2006.01); G01N 27/30 (2006.01); C23C 14/02 (2006.01); C23C 14/10 (2006.01); C23C 14/14 (2006.01); C23C 14/24 (2006.01); C23C 14/34 (2006.01); G01N 27/327 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G01N 27/307 (2013.01); C23C 14/028 (2013.01); C23C 14/08 (2013.01); C23C 14/10 (2013.01); C23C 14/14 (2013.01); C23C 14/24 (2013.01); C23C 14/34 (2013.01); G01N 27/327 (2013.01); G03F 7/16 (2013.01);
Abstract

A method of manufacturing an electrode structure includes providing an initial structure, the initial structure including at least two elevated regions extending from a substrate, wherein top portions of the two elevated regions are separated by a first lateral distance, depositing material onto the elevated regions by means of physical vapor deposition such that adjacent top portions of the deposited material are separated by a second lateral distance that is smaller than the first lateral distance, and applying electrodes onto the top portions of the material.


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