The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2021
Filed:
Mar. 25, 2019
Kitagawa Industries Co., Ltd., Aichi, JP;
Tatsuya Nakamura, Aichi, JP;
Hiroyoshi Ishiguro, Aichi, JP;
Kitagawa Industries Co., Ltd., Aichi, JP;
Abstract
The present invention provides a contact capable of suppressing an increase in a DC resistance value for a long period and a method of manufacturing the same. The contact includes a base portion and an elastic contact portion. The elastic contact portion includes a planar portion configured in a planar shape; and a projection portion that is disposed on one surface of the planar portion and protrudes from the one surface. The elastic contact portion is configured to come into pressed contact with the second surface at the projection portion. The projection portion is configured such that a dimensional ratio H/L of the height H to the length L satisfies≤H/L≤where H is a height in a direction perpendicular to the one surface and L is a length in a direction parallel to the one surface.