The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2021
Filed:
May. 01, 2018
Emagin Corporation, Hopewell Junction, NY (US);
Fridrich Vazan, Pittsford, NY (US);
Evan P. Donoghue, Hopewell Junction, NY (US);
Ilyas I. Khayrullin, Hopewell Junction, NY (US);
Tariq Ali, Hopewell Junction, NY (US);
Kerry Tice, Hopewell Junction, NY (US);
Amalkumar P. Ghosh, Hopewell Junction, NY (US);
eMagin Corporation, Hopewell Junction, NY (US);
Abstract
A shadow mask that includes compensation layer operative for at least partially correcting gravity-induced sag of a shadow-mask membrane is disclosed. The compensation layer is formed on a surface of the shadow-mask membrane such that the compensation layer is characterized by a residual stress that gives rise to a first bending moment in the membrane, where the first bending moment is directed in the opposite direction to a second bending moment in the membrane that is induced by the effect of gravity.