The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Sep. 18, 2019
Applicant:

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Hideyuki Okita, Toyama, JP;

Manabu Yanagihara, Osaka, JP;

Takahiro Sato, Toyama, JP;

Masahiro Hikita, Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/205 (2006.01); H01L 29/778 (2006.01); H01L 29/417 (2006.01); H01L 29/36 (2006.01); H01L 29/207 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 29/43 (2006.01); H01L 29/20 (2006.01); H01L 21/306 (2006.01); H01L 21/223 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7787 (2013.01); H01L 21/0254 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/207 (2013.01); H01L 29/36 (2013.01); H01L 29/41758 (2013.01); H01L 29/432 (2013.01); H01L 29/66462 (2013.01); H01L 21/0262 (2013.01); H01L 21/0274 (2013.01); H01L 21/02381 (2013.01); H01L 21/2233 (2013.01); H01L 21/2236 (2013.01); H01L 21/30621 (2013.01);
Abstract

A nitride semiconductor device includes: a substrate; a first nitride semiconductor layer; a second nitride semiconductor layer having a greater band gap than the first nitride semiconductor layer; a source electrode and a drain electrode on the second nitride semiconductor layer apart from each other; a third nitride semiconductor layer, between the source electrode and the drain electrode, containing a p-type first impurity and serving as a gate; and a fourth nitride semiconductor layer, between the third nitride semiconductor layer and the drain electrode, containing a p-type second impurity, wherein the average carrier concentration of the fourth nitride semiconductor layer is lower than the average carrier concentration of the third nitride semiconductor layer.


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