Memory device and a method for forming the memory device

Abstract

A memory device may include a first conductivity region, and second and third conductivity regions arranged at least partially within the first conductivity region. The first and second conductivity regions may have a different conductivity type from at least a part of the third conductivity region. The memory device may include first and second gates arranged over the third conductivity region. The second conductivity region may be coupled to a source line, and the gates may be coupled to respective word lines. When a predetermined write voltage difference is applied between the source line and a word line, an oxide layer of the gate coupled to the word line may break down to form a conductive link between the gate electrode of the gate and the third conductivity region. The memory device may have a smaller cell area, and may be capable of operating at both higher and lower voltages.