The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2021
Filed:
Aug. 18, 2020
Clo Virtual Fashion Inc., Seoul, KR;
CLO VIRTUAL FASHION INC., Seoul, KR;
Abstract
A grading method and apparatus for garments including supplemental materials is provided. The grading method and apparatus calculates three-dimensional (3D) strain information between a 3D source avatar and a 3D target avatar, calculates two-dimensional (2D) strain information of a 2D pattern corresponding to source garments draped over the 3D source avatar based on the 3D strain information, determines grading information for grading the 2D pattern to correspond to the 3D target avatar based on the 2D strain information, identifies at least one supplemental material included in the source garments, extracts at least one polygon matching the at least one supplemental material among a plurality of polygons modeling the 2D pattern, and performs grading on the at least one supplemental material based on grading information of the at least one polygon.