The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2021
Filed:
Jan. 21, 2021
National Technology & Engineering Solutions of Sandia, Llc, Albuquerque, NM (US);
Joseph J. Reczek, New Albany, OH (US);
Madeline Van Winkle, Berkeley, CA (US);
Harper O. W. Wallace, Dallas, TX (US);
Bryan James Kaehr, Albuquerque, NM (US);
Joseph J. Reczek, New Albany, OH (US);
Madeline Van Winkle, Berkeley, CA (US);
Harper O. W. Wallace, Dallas, TX (US);
National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US);
Abstract
A charge-transfer material enables patterning approach where the polarization angle in stand-alone films can be precisely defined at the single pixel level and reconfigured following initial alignment. This capability enables new routes for non-binary information storage, retrieval, and intrinsic encryption, and it suggests future technologies such as photonic chips that can be reconfigured using non-contact patterning.