The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

May. 18, 2018
Applicants:

Sourabh Saha, Livermore, CA (US);

Shih-chi Chen, Shatin, HK;

Yina Chang, Shatin, HK;

Inventors:

Sourabh Saha, Livermore, CA (US);

Shih-Chi Chen, Shatin, HK;

Yina Chang, Shatin, HK;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); G02B 26/08 (2006.01); G02B 27/14 (2006.01); B23K 26/06 (2014.01); B33Y 30/00 (2015.01); B23K 26/073 (2006.01); B23K 26/352 (2014.01); B29C 64/268 (2017.01); B29C 64/135 (2017.01); B23K 26/067 (2006.01); B29C 64/286 (2017.01);
U.S. Cl.
CPC ...
G02B 27/106 (2013.01); B23K 26/06 (2013.01); B23K 26/067 (2013.01); B23K 26/073 (2013.01); B23K 26/355 (2018.08); B29C 64/135 (2017.08); B29C 64/268 (2017.08); B29C 64/286 (2017.08); B33Y 30/00 (2014.12); G02B 26/0833 (2013.01); G02B 27/14 (2013.01);
Abstract

A laser-based manufacturing system is disclosed for fabricating non-planar three-dimensional layers. The system may have a laser for producing a laser beam with a plurality of optical wavelengths. An optically dispersive element may be used for receiving the laser beam and splitting the beam into a plurality of distinct beam components, wherein each beam component has spatially separated optical spectral components. A phase mask may be used which is configured to receive at least one of the beam components emerging from the dispersive element and to create a modified beam. One or more focusing elements may then be used to receive the modified beam emerging from the phase mask and to focus the modified beam into a non-planar light sheet for use in fabricating a part.


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