The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Mar. 06, 2020
Applicant:

Trumpf Laser- Und Systemtechnik Gmbh, Ditzingen, DE;

Inventors:

Malte Kumkar, Weimar, DE;

Daniel Grossmann, Suessen, DE;

Daniel Flamm, Stuttgart, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/09 (2006.01); G02B 27/42 (2006.01); B23K 26/0622 (2014.01); B23K 26/064 (2014.01); B23K 26/066 (2014.01);
U.S. Cl.
CPC ...
G02B 27/0944 (2013.01); B23K 26/064 (2015.10); B23K 26/066 (2015.10); B23K 26/0622 (2015.10); B23K 26/0624 (2015.10); G02B 27/425 (2013.01);
Abstract

A diffractive optical beam shaping element for imposing a phase distribution on a laser beam that is intended for laser processing of a material includes a phase mask that is shaped as an area and is configured for imposing a plurality of beam shaping phase distributions on the laser beam incident on to the phase mask. A virtual optical image is attributed to at least one of the plurality of beam shaping phase distributions, wherein the virtual image can be imaged into an elongated focus zone for creating a modification in the material to be processed. Multiple such elongated focus zones can spatially add up and interfere with each other, to modify an intensity distribution in the material and, for example, generate an asymmetric modification zone.


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