The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

May. 31, 2017
Applicant:

Stmicroelectronics (Crolles 2) Sas, Crolles, FR;

Inventors:

Vincent Farys, Saint Martin d'Hères, FR;

Alain Inard, Saint Nazaire les Eymes, FR;

Olivier Noblanc, Grenoble, FR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/02 (2006.01); C23C 16/34 (2006.01); C23C 16/56 (2006.01); C23C 18/12 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0263 (2013.01); C23C 16/345 (2013.01); C23C 16/56 (2013.01); C23C 18/1208 (2013.01); G02B 5/0236 (2013.01); G02B 5/0268 (2013.01);
Abstract

Methods of manufacture of an optical diffuser. In one embodiment, an optical diffuser is formed by providing a wafer including a silicon slice of which an upper face is covered with a first layer made of a first material itself covered with a second layer made of a second selectively etchable material with respect to the first material. The method further includes forming openings in the second layer extending up to the first layer and filling the openings in the second layer with a third material. The method yet further includes bonding a glass substrate to the wafer on the side of its upper face and removing the silicon slice.


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