The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Aug. 31, 2016
Applicant:

Honeywell International Inc., Morris Plains, NJ (US);

Inventors:

Yuzhong Yu, Morris Plains, NJ (US);

Ling Liu, Morris Plains, NJ (US);

Feng Liang, Morris Plains, NJ (US);

Assignee:

Honeywell International Inc., Morris Plains, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/38 (2006.01); G01N 27/30 (2006.01); G01N 27/403 (2006.01); G01N 33/00 (2006.01);
U.S. Cl.
CPC ...
G01N 27/301 (2013.01); G01N 27/38 (2013.01); G01N 27/403 (2013.01); G01N 33/0029 (2013.01);
Abstract

Methods and systems for identifying contamination of an electrochemical sensor () and cleaning the electrochemical sensor () are provided. A method may comprise scanning the sensor () for the first time using CV to generate a reference set of readings; scanning the sensor () for the second time after the sensor () has been employed; comparing a second set of readings from the second CV scan to the reference set of readings; when the second set of readings is different from the reference set of readings, determining that the sensor () potential has shifted; scanning the sensor () for the third time to clean one or more elements of the sensor (); scanning the sensor () for the fourth time; comparing a fourth set of readings from the fourth CV scan to the second set of readings; and determining that the potential of the sensor () has shifted due to pollution of the sensor (), and/or that the sensor () can be further cleaned.


Find Patent Forward Citations

Loading…