The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Jan. 24, 2020
Applicant:

Brother Kogyo Kabushiki Kaisha, Nagoya, JP;

Inventors:

Yoko Yamanashi, Konan, JP;

Yukiyoshi Muto, Nagoya, JP;

Takafumi Naka, Ama, JP;

Fuyuki Nakashima, Ibi-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05B 53/00 (2006.01); D05B 19/16 (2006.01); D05B 69/12 (2006.01); D05B 27/00 (2006.01);
U.S. Cl.
CPC ...
D05B 53/00 (2013.01); D05B 19/16 (2013.01); D05B 27/00 (2013.01); D05B 69/12 (2013.01); D05D 2209/16 (2013.01);
Abstract

A sewing machine includes a movement mechanism, a swinging mechanism, a presser device, a guide portion, a processor, and a memory configured to store computer-readable instructions that, when executed by the processor, instruct the processor to perform processes. The processes include acquiring pattern data used for sewing a couching pattern in which a plurality of motifs are continuously arranged. The motif is configured in a predetermined shape by a plurality of stitches including a main stitch and a sub-stitch. The processes include correcting at least one selected from the group of a start point position and an end point position of the main stitch of one of the motifs, such that the length of the main stitch of the one motif is longer in a second case than in a first case, and driving the movement mechanism and the swinging mechanism in accordance with the corrected pattern data.


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