The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2021
Filed:
Jan. 26, 2018
Emagin Corporation, Hopewell Junction, NY (US);
Ilyas I. Khayrullin, Hopewell Junction, NY (US);
Amalkumar P. Ghosh, Hopewell Junction, NY (US);
Ihor Wacyk, Hopewell Junction, NY (US);
Evan Donoghue, Hopewell Junction, NY (US);
Tariq Ali, Hopewell Junction, NY (US);
Qi Wang, Hopewell Junction, NY (US);
Kerry Tice, Hopewell Junction, NY (US);
eMagin Corporation, Hopewell Junction, NY (US);
Abstract
In a method for designing and fabricating a micro-lens array, a design is finalized by varying certain features of a shadow mask, varying a distance between a source of lens-forming material and the shadow mask, and varying other parameters until the features and distances result in the formation of a micro-lens having desired shape, etc. A shadow mask in accordance with the design is then fabricated and is appropriately positioned with respect to a micro-display and a source of lens-forming material. A plume of lens-forming material is then generated under reduced pressure and which propagates toward the shadow mask, directly patterning the micro-lenses on sub-pixels of the micro-display.