The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Dec. 31, 2018
Applicant:

Palo Alto Research Center Incorporated, Palo Alto, CA (US);

Inventors:

Anne Plochowietz, Palo Alto, CA (US);

Eugene M. Chow, Palo Alto, CA (US);

Jengping Lu, Fremont, CA (US);

Julie A. Bert, East Palo Alto, CA (US);

David K. Biegelsen, Portola Valley, CA (US);

Bradley Rupp, San Francisco, CA (US);

Sourobh Raychaudhuri, Mountain View, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 4/00 (2006.01); B81C 3/00 (2006.01); B81C 1/00 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B81C 3/004 (2013.01); B81C 1/00031 (2013.01); B81B 2203/04 (2013.01); B81B 2207/056 (2013.01); B81C 2201/0149 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); Y10T 29/49002 (2015.01);
Abstract

Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause phototransistors or electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler.


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