The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Jun. 10, 2016
Applicant:

Danmarks Tekniske Universitet, Kgs. Lyngby, DK;

Inventors:

Xiaolong Zhu, Kgs. Lyngby, DK;

Anders Kristensen, Frederiksbeg, DK;

Emil Højlund-Nielsen, Copenhagen, DK;

Christoph Vannahme, Charlottenlund, DK;

Niels Asger Mortensen, Kgs. Lyngby, DK;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41M 5/34 (2006.01); G02B 5/00 (2006.01); G11B 11/03 (2006.01); B41M 5/46 (2006.01); B41M 7/00 (2006.01); B23K 26/354 (2014.01); B41M 5/40 (2006.01); G02B 5/18 (2006.01); G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
B41M 5/34 (2013.01); B23K 26/354 (2015.10); B41M 5/40 (2013.01); B41M 5/46 (2013.01); B41M 7/0081 (2013.01); G02B 5/008 (2013.01); G11B 11/03 (2013.01); G02B 5/1809 (2013.01); G02B 5/1842 (2013.01); G02B 5/203 (2013.01); G02B 2207/101 (2013.01);
Abstract

There is presented a method for geometrically modifying plasmonic structures on a support structure, such as for printing or recording, said method comprising changing a geometry specifically of plasmonic structures, wherein said changing the geometry is carried out by photothermally melting at least a portion of each of the plasmonic structures within the second plurality of plasmonic structures by irradiating, the plasmonic structures with incident electromagnetic radiation having an incident intensity in a plane of the second plurality of plasmonic structures, wherein said incident intensity is less than an incident intensity required to melt a film of a corresponding material and a corresponding thickness as the plasmonic structures within the second plurality of plasmonic structures.


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