The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2021
Filed:
Oct. 22, 2018
Applicant:
Samsung Display Co., Ltd., Yongin-si, KR;
Inventors:
Assignee:
Samsung Display Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/382 (2014.01); B23K 26/082 (2014.01); B23K 26/067 (2006.01); B23K 26/0622 (2014.01); C23C 14/04 (2006.01); C23C 16/04 (2006.01); B23K 26/06 (2014.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
B23K 26/382 (2015.10); B23K 26/0622 (2015.10); B23K 26/0626 (2013.01); B23K 26/0676 (2013.01); B23K 26/082 (2015.10); C23C 14/042 (2013.01); C23C 16/042 (2013.01); H01L 51/0011 (2013.01);
Abstract
A method of manufacturing a deposition mask including: arranging a deposition mask to be processed on a stage and forming a deposition hole in the deposition mask by irradiating the deposition mask with a laser beam. The laser beam forming the deposition hole is irradiated plural times in an identical moving path in a region where the deposition hole is formed, the laser beam includes a pulse laser, and pulse energy of the laser beam when the laser beam is irradiated once is different from pulse energy of the laser beam when the laser beam is irradiated twice.