The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 2021

Filed:

Jul. 05, 2019
Applicants:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;

Inventors:

Sungsoo Kim, Suwon-si, KR;

Youngjoong Yoon, Seoul, KR;

Sunghoe Kim, Seoul, KR;

Janghwan Bae, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 21/06 (2006.01); H01Q 21/00 (2006.01); H01Q 1/52 (2006.01); H01Q 1/22 (2006.01); H01Q 21/24 (2006.01); H01Q 1/44 (2006.01); H01Q 1/24 (2006.01);
U.S. Cl.
CPC ...
H01Q 21/064 (2013.01); H01Q 1/22 (2013.01); H01Q 1/243 (2013.01); H01Q 1/44 (2013.01); H01Q 1/52 (2013.01); H01Q 1/523 (2013.01); H01Q 21/00 (2013.01); H01Q 21/0025 (2013.01); H01Q 21/06 (2013.01); H01Q 21/24 (2013.01);
Abstract

Various embodiments disclosed herein relate to an antenna device that provides a wireless communication function and an electronic device including the antenna device is provided. The electronic device includes a communication module and an antenna structure electrically connected to the communication module. The antenna structure may include a conductive substrate including a first area and a second area adjacent to the first area a plurality of first slits formed in the first area of the conductive substrate parallel to each other with a first predetermined interval therebetween in a predetermined direction and a plurality of second slits formed in the second area of the conductive substrate at a position corresponding to an inter-slit area between at least some slits among the plurality of first slits.


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