The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Jun. 30, 2020
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Young Hun Lee, Chungcheongnam-do, KR;
Eui Sang Lim, Cheonan-si, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-Do, KR;
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B08B 3/024 (2013.01); B08B 2203/0229 (2013.01);
Abstract
Disclosed is a method for liquid-treating a substrate. In a method for treating a substrate, the substrate may be treated by supplying a treatment liquid onto the rotating substrate by using a first nozzle and a second nozzle, the first nozzle supplies the treatment liquid to an area including a central area on the substrate, and the second nozzle supplies the treatment liquid to a peripheral area of the substrate.
Lee, Young. (2021). Method for treating substrate involving supplying treatment liquid to peripheral area of substrate by second nozzle (U.S. Patent No. 11145520). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11145520
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile