The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Jul. 12, 2017
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Satomi Takahashi, Shizuoka, JP;
Seongmu Bak, Shizuoka, JP;
Atsushi Mizutani, Shizuoka, JP;
Tadashi Inaba, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/304 (2006.01); H01L 21/02 (2006.01); C07D 213/70 (2006.01); H01L 21/311 (2006.01); C07D 249/12 (2006.01); C07D 239/40 (2006.01); C07C 323/12 (2006.01); C07C 323/52 (2006.01); C07C 323/58 (2006.01); H01L 21/306 (2006.01); C07C 321/04 (2006.01); C07C 321/22 (2006.01); C07C 321/26 (2006.01); C22B 30/04 (2006.01); C22B 58/00 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 21/304 (2013.01); C07C 321/04 (2013.01); C07C 321/22 (2013.01); C07C 321/26 (2013.01); C07C 323/12 (2013.01); C07C 323/52 (2013.01); C07C 323/58 (2013.01); C07D 213/70 (2013.01); C07D 239/40 (2013.01); C07D 249/12 (2013.01); C22B 30/04 (2013.01); C22B 58/00 (2013.01); H01L 21/02052 (2013.01); H01L 21/02057 (2013.01); H01L 21/3081 (2013.01); H01L 21/30604 (2013.01); H01L 21/31111 (2013.01); Y02P 20/582 (2015.11);
Abstract
Provided are a removal liquid for removing an oxide of a Group III-V element, an oxidation prevention liquid for preventing the oxidation of an oxide of a Group III-V element or a treatment liquid for treating an oxide of a Group III-V element, each liquid including an acid and a mercapto compound; and a method using each of the same liquids. Further provided are a treatment liquid for treating a semiconductor substrate, including an acid and a mercapto compound, and a method for producing a semiconductor substrate product using the same.