The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Feb. 20, 2020
Perkinelmer, Inc., Waltham, MA (US);
Tak Shun Cheung, Scarborough, CA;
Chui Ha Cindy Wong, Markham, CA;
Andrew Icasiano, Brampton, CA;
Brian Chan, Markham, CA;
PerkinElmer, Inc., Waltham, MA (US);
Abstract
Thermal management arrangements for analysis systems including a plasma source such as inductively-coupled-plasma are disclosed. An analysis system may include a plasma source configured to a plasma source configured to receive and ionize a sample to create an ionized sample, and an instrument such as a mass spectrometer or optical emission spectrometer configured to receive and analyze the ionized sample. A heat shield may be positioned between the plasma source and the instrument, and the heat shield may be constructed and arranged to direct heated gas and/or plasma from the plasma source away from the instrument. In some instances, the heated gas and/or plasma may be extracted from a chamber containing the plasma source.