The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 2021

Filed:

Jul. 27, 2020
Applicant:

Carl Zeiss Industrielle Messtechnik Gmbh, Oberkochen, DE;

Inventor:

Marco Erler, Oberkochen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/08 (2006.01); H01J 35/24 (2006.01);
U.S. Cl.
CPC ...
H01J 35/08 (2013.01); H01J 35/24 (2013.01); H01J 2235/086 (2013.01); H01J 2235/1204 (2013.01);
Abstract

A target for a radiation source of invasive electromagnetic radiation has at least one target element, which is configured to generate invasive electromagnetic radiation when irradiated with particles and is coupled to a substrate arrangement for dissipating heat out of the target element, wherein: the target element has a peripheral surface which forms a first part of the outer surface of the target element; the outer surface of the target element is also formed by a side surface of the target element; an extension of the side surface defines a thickness (D) of the target element; a peripheral line of the side surface forms a borderline of the peripheral surface; the target has an end face, as part whereof the side surface of the target element is exposed for irradiation with particles; and the substrate arrangement is in contact with the peripheral surface.


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