The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Jun. 14, 2019
General Electric Company, Schenectady, NY (US);
Vipul Kumar Gupta, Guilderland, NY (US);
Natarajan Chennimalai Kumar, Niskayuna, NY (US);
Anthony J Vinciquerra, III, Rexford, NY (US);
Randal T Rausch, Schenectady, NY (US);
Subhrajit Roychowdhury, Schenectady, NY (US);
Justin John Gambone, Jr., Schenectady, NY (US);
General Electric Company, Schenectady, NY (US);
Abstract
A method of additive manufacturing machine (AMM) build process control includes obtaining AMM machine and process parameter settings, accessing sensor data for monitored physical conditions in the AMM, calculating a difference between expected AMM physical conditions and elements of the monitored conditions, providing the machine and process parameter settings, monitored conditions, and differences to one or more material property prediction models, computing a predicted value or range for the monitored conditions, comparing the predicted value or range to a predetermined target range, based on a determination that predicted value(s) are within the predetermined range, maintaining the machine and process parameter settings, or based on a determination that one or more of the predicted value(s) is outside the predetermined range, generating commands to compensate the machine and process parameter settings, and repeating the closed feedback loop at intervals of time during the build process. A system and a non-transitory medium are also disclosed.