The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 2021

Filed:

Dec. 20, 2018
Applicant:

Leica Microsystems Cms Gmbh, Wetzlar, DE;

Inventor:

Jonas Foelling, Heidelberg, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 21/06 (2006.01); G02B 21/00 (2006.01); G01N 21/64 (2006.01);
U.S. Cl.
CPC ...
G02B 21/0032 (2013.01); G01N 21/6458 (2013.01); G02B 21/008 (2013.01); G02B 21/0076 (2013.01); G01N 2201/04 (2013.01);
Abstract

A method for imaging a sample using a fluorescence microscope with stimulated emission depletion includes controlling the fluorescence microscope and an imaging process of the fluorescence microscope by a microscope controller. An overview image of a target region is generated with a second spatial resolution prior to the imaging process, the second spatial resolution being lower than a first spatial resolution used for scanning sample segments in the imaging process and higher than a third spatial resolution that has been adapted to an extent of an excitation light distribution. The overview image is analyzed to identify image regions without relevant image information. A radiant flux of the depletion light distribution is reduced within a scope of the imaging process when scanning sample segments which are assigned to the image regions without relevant image information.


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