The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Apr. 12, 2021
Nanova Environmental, Inc., Columbia, MO (US);
Biyan Chen, Columbia, MO (US);
Haisheng Zheng, Columbia, MO (US);
Jun Yin, Columbia, MO (US);
Qiao Zhang, Columbia, MO (US);
Nanova Environmental, Inc., Columbia, MO (US);
Abstract
A gas ionization chamber, includes a first electrode, a fence electrode disposed below the first electrode, a second electrode disposed below the fence electrode, a first dielectric layer disposed between the first electrode and the fence electrode, and a second dielectric layer disposed between the fence electrode and the second electrode. The first and second electrodes, and the first and second dielectric layers include a plurality of aligned holes forming channels configured to permit gas flow between the first electrode to the second electrode through an opening in the fence electrode, the plurality of aligned holes being arranged in a pattern having a central region with a first set of aligned holes and a peripheral region having a second set of aligned holes, and wherein a diameter of at least one hole of the first set of aligned holes is less than or equal to about 0.5 millimeters.